Growth of Wafer-scaled high quality epitaxial VO2 Thin Films Using a Chemical Solution Approach

2016中国国际功能材料大会(CIFM 2016)——Epitaxial VO2 thin films with controllable phase can be deposited by using the PAD technique.

关键词: growth window;thin film;chemical solution approach 2016中国国际功能材料大会(CIFM 2016)

主讲人:Prof. Yuan Lin 机构:University of Electronic Science and Technology of China

时长:0:27:20 年代:2016年