Elongated lnductively Coupled Plasma Torch for Annealing Processes（2）
The 7th ENGII Conference（Workshop7 2015）——ICP was first utilized as a thermal plasma in the 1960s, long before it began being used as a high density plasma source for dry etching in semiconductor processing. Since then, ICP torches have been used in the field of spray coating and spectroscopic analysis.
关键词： inductively coupled plasma torch;rapid thermal processing;annealing process The 7th ENGII Conference（Workshop7 2015）
主讲人：Dr. Tomohiro Okumura 机构：Panasonic Corporation, Japan
时长：0:10:51 年代：2015年
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