Elongated lnductively Coupled Plasma Torch for Annealing Processes(1)

The 7th ENGII Conference(Workshop7 2015)——ICP was first utilized as a thermal plasma in the 1960s, long before it began being used as a high density plasma source for dry etching in semiconductor processing. Since then, ICP torches have been used in the field of spray coating and spectroscopic analysis.

关键词: inductively coupled plasma torch;rapid thermal processing;annealing process The 7th ENGII Conference(Workshop7 2015)

主讲人:Dr. Tomohiro Okumura 机构:Panasonic Corporation, Japan

时长:0:12:14 年代:2015年